Upcoming Events



The 14th Fraunhofer IISB Lithography Simulation Workshop will be held September 22-24 2016

  • Computational resolution enhancements for lithography, microscopy and other imaging applications
  • Modeling of material-driven resolution enhancements: directed self-assembly (DSA), multi-color lithography
  • Computational challenges of EUV lithography: high NA, new mask stacks, stochastic effects
  • Lithography applications beyond CMOS: Silicon-photonics, MEMS, flat panel displays, bio-sensing, …

 

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Past Events

take a look at the topics and ideas dicussed in
past workshops and courses



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