Upcoming Events



The 12th Fraunhofer IISB Lithography Simulation Workshop will be held September 11-13 2014

  • Material-driven versus wavelength-driven scaling: latest results from double patterning, directed self-assembly and EUV.
  • Combination of simulation and metrology: methods to retrieve modeling parameters from metrology, enhancement of metrology by modeling.
  • Lithography applications beyond CMOS: 3D nanoprinting, fabrication of photonic components, MEMS and others.




Past Events

take a look at the topics and ideas dicussed in
past workshops and courses



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