Upcoming Events

The 13th Fraunhofer IISB Lithography Simulation Workshop was held September 10-12 2015

  • Computational chemistry for material-driven resolution enhancements: directed self-assembly,
    multiple patterning and novel imaging materials
  • Computational optics for the creation and detection of micro- and nanopatterns: similarities and
    differences between resolution enhancements in lithography and microscopy
  • Computational challenges of EUV lithography



Past Events

take a look at the topics and ideas dicussed in
past workshops and courses

IISB Workshop Theme Image