Upcoming Events

The 14th Fraunhofer IISB Lithography Simulation Workshop will be held September 22-24 2016

  • Computational resolution enhancements for lithography, microscopy and other imaging applications
  • Modeling of material-driven resolution enhancements: directed self-assembly (DSA), novel photoresist materials, multi-color lithography
  • Computational challenges of EUV lithography: high NA, new mask stacks, stochastic effects
  • Lithography applications beyond CMOS: Si-photonics, flat-panel displays, bio-sensing, MEMS, …


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Past Events

take a look at the topics and ideas dicussed in
past workshops and courses

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